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  • 99.99% High Pure Aluminum Sputter Target
  • 99.99% High Pure Aluminum Sputter Target
  • 99.99% High Pure Aluminum Sputter Target
99.99% High Pure Aluminum Sputter Target 99.99% High Pure Aluminum Sputter Target 99.99% High Pure Aluminum Sputter Target

99.99% High Pure Aluminum Sputter Target

  • Product Name;Aluminum Sputter Target
  • Purity：99.99%
  • Density：2.702g/cm3
  • Origin:China
  • Product description: 99.99% High Pure Aluminum Sputter Target
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Specification：

Product Name

Aluminum Target/ Al Target

Purity

99.99%

Boiling Point

2467℃

Melting Point

660.37℃

Theoretical Density

2.702g/cm3

Size

Can be customized

Application

PVD Coating

 Aluminum Sputter Target

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